Regular Paper

Genesis of focused ion beams for plasma nanotechnology using a bounded microwave plasma source

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Published 28 November 2014 © 2015 The Japan Society of Applied Physics
, , Citation Sudeep Bhattacharjee and Samit Paul 2015 Jpn. J. Appl. Phys. 54 01AA06 DOI 10.7567/JJAP.54.01AA06

1347-4065/54/1S/01AA06

Abstract

Bounded plasmas exhibit many interesting properties that are not found in plasmas of "infinite" extent such as space and astrophysical plasmas. Our studies have revealed that the dispersion properties of waves in a bounded magnetoplasma deviates considerably from the predictions of the Clemmow–Mullaly–Allis (CMA) model, giving rise to new regimes of wave propagation and absorption. This article highlights some of these interesting effects observed in experiments. One of the principal outcomes of this research is the genesis of a novel multielement focused ion beam (MEFIB) system that utilizes compact bounded plasmas in a minimum-B field to provide intense focused ion beams of a variety of elements for plasma-based nanotechnology.

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10.7567/JJAP.54.01AA06