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Model system for controlling strain in silicon at the atomic scale

Philipp Studer, Steven R. Schofield, Greg Lever, David R. Bowler, Cyrus F. Hirjibehedin, and Neil J. Curson
Phys. Rev. B 84, 041306(R) – Published 22 July 2011

Abstract

Strain induced by antiphase boundaries (APBs) in the Si(111)2×1 surface is investigated using scanning tunneling microscopy (STM), laterally resolved scanning tunneling spectroscopy (STS), and density functional theory (DFT). We determine the structure of all identified APB reconstructions and show that a band shift of states close to the Fermi energy leads to the previously observed electronic contrast. The orientation of the band shift and the observed movement of APBs within the surface are explained by surface strain resulting from the excess free energy of the boundary. We demonstrate that the location of APBs and their associated strain can be precisely manipulated, making them an ideal model system to study and control strain at the atomic scale.

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  • Received 1 June 2011

DOI:https://doi.org/10.1103/PhysRevB.84.041306

©2011 American Physical Society

Authors & Affiliations

Philipp Studer1,2, Steven R. Schofield1,3, Greg Lever3, David R. Bowler1,3, Cyrus F. Hirjibehedin1,3,4, and Neil J. Curson1,2

  • 1London Centre for Nanotechnology, UCL, London, WC1H 0AH, United Kingdom
  • 2Department of Electronic and Electrical Engineering, UCL, London, WC1E 7JE, United Kingdom
  • 3Department of Physics and Astronomy, UCL, London, WC1E 6BT, United Kingdom
  • 4Department of Chemistry, UCL, London, WC1H 0AJ, United Kingdom

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Issue

Vol. 84, Iss. 4 — 15 July 2011

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