SCHEDULED MAINTENANCE
A method is described for the determination of fluorine in aqueous samples via the chemical generation of silicon tetrafluoride. The generated vapour was swept to a direct current plasma and silicon measured by atomic emission spectrometry. The detection limit obtained for fluorine was 0.9 µg ml–1 for a 100-µl sample.
N. Barnett, H. Beere, L. Ebdon and B. Fairman, J. Anal. At. Spectrom., 1989, 4, 805 DOI: 10.1039/JA9890400805
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