Influence of boron doping on the dynamics of formation of Os metal nanoclusters on graphitic surfaces
Anaïs
Pitto-Barry 
a
and
Nicolas P. E.
Barry
*a
a
and
Nicolas P. E.
Barry
*a
Abstract
The fabrication of osmium nanoclusters from single atoms has been studied in real-time on B-doped and B-free graphitic surfaces. The dynamics of nucleation on both surfaces are identified, captured, and reported. The nucleation is ca. 2× faster on B-doped surface compared to the B-free surface (38 pm min−1versus 18 pm min−1), suggesting osmium–boron interactions within the nanomaterials.
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