Volume 165, 2013

Formation of secondary organic aerosol marker compounds from the photooxidation of isoprene and isoprene-derived alkene diols under low-NOx conditions

Abstract

In the present work, we have evaluated whether isomeric C5-alkene diols (1,2-dihydroxy-2-methyl-3-butene, 1,2-dihydroxy-3-methyl-3-butene, and 1,4-dihydroxy-2-methyl-2-butene (cis + trans)), which have first been detected upon photooxidation of isoprene in the absence of NO and are known to be formed in the ambient atmosphere, can serve as precursors for the 2-methyltetrols, C5-alkene triols, and 2-methylglyceric acid under low-NOx conditions. The C5-alkene diols were prepared following published synthesis procedures. It is shown that under the applied chamber conditions the isomeric C5-alkene diols give rise to 2-methyltetrols with different threo/erythro abundance ratios and that certain diols produce 2-methylglyceric acid, but that they do not form C5-alkene triols. Furthermore, it is shown that the photooxidation of isoprene under the applied chamber conditions employing photolysis of H2O2 under dry conditions yields relatively small amounts of C5-alkene triols compared to those of the 2-methyltetrols, unlike under ambient conditions. It is argued that the chamber conditions are not optimal for the formation of C5-epoxydiols, which serve as gas-phase precursors for the C5-alkene triols, and likely as in some previous studies favor the formation of C5-alkene diols as a result of RO2 + RO2 reactions.

Supplementary files

Article information

Article type
Paper
Submitted
15 May 2013
Accepted
31 May 2013
First published
31 May 2013

Faraday Discuss., 2013,165, 261-272

Formation of secondary organic aerosol marker compounds from the photooxidation of isoprene and isoprene-derived alkene diols under low-NOx conditions

W. Wang, Y. Iinuma, A. Kahnt, O. Ryabtsova, A. Mutzel, R. Vermeylen, P. Van der Veken, W. Maenhaut, H. Herrmann and M. Claeys, Faraday Discuss., 2013, 165, 261 DOI: 10.1039/C3FD00092C

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