1 Erratum to: Microsyst Technol (2009) 15:117–121 DOI 10.1007/s00542-008-0700-6

  • In the legend of Fig. 5 the symbol K for the intensity should not be confused with the K used to designate Bessel functions in Eqs. 5 and 8 and the third line in this figure caption should read

    “…K − K 0, where K = 2 sin θ/λ and K 0 is the value of K at the exact…”

  • The factor b in the first term of the r.h.s. of Eq. 8 should be replaced by by; i.e. Eq. 8 should read

    $$ \varepsilon_{x} = - {\frac{b}{{4\pi \left( {1 - \nu } \right)}}}y\left[ {{\frac{{\left( {1 - 2\nu } \right)r^{2} + 2x^{2} }}{{r^{4} }}}} \right] + {\frac{b}{{2\pi \left( {1 - \nu } \right)}}}y\left[ {\left( {y^{2} - \nu r^{2} } \right)\Upphi_{1} + \left( {3x^{2} - y^{2} } \right)\Upphi_{2} } \right] $$
    (8)